Fundamentals of semiconductor fabrication / Gary S. May, Simon M. Sze.
Publisher: New York : Wiley, c2004Edition: Wiley international edDescription: xiii, 305 p. : ill. ; 26 cmISBN: 0471232793Subject(s): Semiconductors -- Design and construction | Telecommunication Engineering --DDC classification: 621.381,MAY Online resources: Contributor biographical information | Publisher description | Table of contents
Contents:
Introduction (Page-1), Crystal Growth (Page-17), Silicon Oxidation (Page-41), Photolithography (Page-60), Etching (Page-85), Diffusion (Page-105), ION Implantation (Page-124), Film Deposition (Page-144), Process Integration (Page-182), IC Manufacturing (Page-226), Further Trends and Challenges (Page-259).
| Item type | Current location | Home library | Shelving location | Call number | URL | Status | Notes | Date due | Barcode | Item holds |
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Military College of Signals (MCS) | Military College of Signals (MCS) | General Stacks | 621.381,MAY (Browse shelf) | Link to resource | Available | Almirah No.31, Shelf No.4 | MCS31016 |
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| 621.381,MAL Experiments for electronic principles / | 621.381,MAN Fundamentals of electronics / | 621.381,MAR Security electronics circuits manual / | 621.381,MAY Fundamentals of semiconductor fabrication / | 621.381,MEA Foundations of electronics / | 621.381,MEA Technician electronics 2 / | 621.381,MIL Modern electronic communication (Include CD) / |
Introduction (Page-1), Crystal Growth (Page-17), Silicon Oxidation (Page-41), Photolithography (Page-60), Etching (Page-85), Diffusion (Page-105), ION Implantation (Page-124), Film Deposition (Page-144), Process Integration (Page-182), IC Manufacturing (Page-226), Further Trends and Challenges (Page-259).
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