VLSI fabrication principles : silicon and gallium arsenide / Sorab K. Ghandhi.
Publisher: New York : Wiley, c1983Description: xi, 665 p. : ill. ; 24 cmISBN: 0471868337 :Subject(s): Gallium arsenide | Silicon | Telecommunication EngineeringDDC classification: 621.38171,GHA Online resources: Publisher description | Table of contents only
Contents:
Material Properties (Page-1), Phase Diagrams and Solid Solubility (Page-49), Crystal Growth and Doping (Page-81), Diffusion (Page-111), Epitaxy (Page-213), Ion Implantation (Page-299), Native Oxide Films (Page-371), Deposits Films (Page-419), Etching and Cleaning (Page-475), Lithographic Processes (Page-533), Device and Circuits Fabrication (Page-567), The Mathematics of Diffusion (Page-639).
| Item type | Current location | Home library | Shelving location | Call number | URL | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|---|---|---|
Book
|
Military College of Signals (MCS) | Military College of Signals (MCS) | General Stacks | 621.38152,GHA (Browse shelf) | Link to resource | Available | Almirah No.33, Shelf No.5 | MCS562 | ||
|
Book
|
Military College of Signals (MCS) | Military College of Signals (MCS) | General Stacks | 621.38152,GHA (Browse shelf) | Link to resource | Available | Almirah No.33, Shelf No.5 | MCS563 |
Total holds: 0
Browsing Military College of Signals (MCS) shelves, Shelving location: General Stacks Close shelf browser
| No cover image available | No cover image available | No cover image available | ||||||
| 621.38152,FLO Electronic devices / | 621.38152,FLO Electronic devices / | 621.38152,GHA VLSI fabrication principles : silicon and gallium arsenide / | 621.38152,GHA VLSI fabrication principles : silicon and gallium arsenide / | 621.38152,HAN Handbook of semiconductor electronics / | 621.38152,HAN Handbook of semiconductor electronics / | 621.38152,HAS Analog VLSI design nMOS and CMOS / |
Material Properties (Page-1), Phase Diagrams and Solid Solubility (Page-49), Crystal Growth and Doping (Page-81), Diffusion (Page-111), Epitaxy (Page-213), Ion Implantation (Page-299), Native Oxide Films (Page-371), Deposits Films (Page-419), Etching and Cleaning (Page-475), Lithographic Processes (Page-533), Device and Circuits Fabrication (Page-567), The Mathematics of Diffusion (Page-639).
Click on an image to view it in the image viewer
There are no comments on this title.