Fundamentals of Semiconductor Fabrication / Gary S. May, Simon M. Sze.
Publisher: New York : Wiley, c2004Edition: Wiley international edDescription: xiii, 305 p. : ill. ; 26 cmISBN: 981253072XSubject(s): Integrated circuits -- Design and construction | Telecommunication EngineeringDDC classification: 621.38152,MAY Online resources: Contributor biographical information | Publisher description | Table of contents
Contents:
Introduction (Page -1), Crystal Growth (Page -17), Silicon Oxidation (Page -41), Photolithography (Page -60), Etching (Page -85), Diffusion (Page -105), Ion Implantation (Page -124), Film Deposition (Page -144), Process Integration (Page -182), IC Manufacturing (Page -226), Future Trends and Challenges (Page -259).
| Item type | Current location | Home library | Shelving location | Call number | URL | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|---|---|---|
Book
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Military College of Signals (MCS) | Military College of Signals (MCS) | General Stacks | 621.38152,MAY (Browse shelf) | Link to resource | Available | Almirah No.33, Shelf No.5 | MCS31226 |
Total holds: 0
Introduction (Page -1), Crystal Growth (Page -17), Silicon Oxidation (Page -41), Photolithography (Page -60), Etching (Page -85), Diffusion (Page -105), Ion Implantation (Page -124), Film Deposition (Page -144), Process Integration (Page -182), IC Manufacturing (Page -226), Future Trends and Challenges (Page -259).
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