NUST Institutions Library Catalogue catalog › Details for: Effect of Processing Parameters on Boron Doped Silica Preform Rods Fabricated Using Modified Chemical Vapor Deposition (MCVD) Process Through Study of its Coefficient of Themal Expansion (CTE)and Refractive index (RI) Changes

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Effect of Processing Parameters on Boron Doped Silica Preform Rods Fabricated Using Modified Chemical Vapor Deposition (MCVD) Process Through Study of its Coefficient of Themal Expansion (CTE)and Refractive index (RI) Changes

By: M.Rizwan Saleem Material type: Text

TextPublisher: ISLAMABAD SCME 2008Description: 60PDDC classification: MTL-MS SA/MI

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Item type	Current location	Home library	Call number	Status	Date due	Barcode	Item holds
Reference	School of Chemical & Materials Engineering (SCME)	School of Chemical & Materials Engineering (SCME)	MTL-MS SA/MI (Browse shelf)	Not for loan		SCME-T0016

Total holds: 0

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