May, Gary S. <br/><br/>
Fundamentals of semiconductor fabrication / 
Gary S. May, Simon M. Sze. 
 - Wiley international ed. 
 - New York :  Wiley,  c2004. 
 - xiii, 305 p. :  ill. ;  26 cm. 
<br/><br/>Introduction (Page-1), Crystal Growth (Page-17), Silicon Oxidation (Page-41), Photolithography (Page-60), Etching (Page-85), Diffusion (Page-105), ION Implantation (Page-124), Film Deposition (Page-144), Process Integration (Page-182), IC Manufacturing (Page-226), Further Trends and Challenges (Page-259).  
<br/><br/><label>ISBN: </label>0471232793 
<br/><br/><label>LCCN: </label>2003276248 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Semiconductors--Design and construction.<br/>Telecommunication Engineering--.
<br/><br/><label>Dewey Class. No.: </label>621.381,MAY