VLSI technology / 
edited by S.M. Sze. 
 - 2nd ed. 
 - New York :  McGraw-Hill,  c1988. 
 - xii, 676 p. :  ill. ;  25 cm. 
 - McGraw-Hill series in electrical engineering. .
<br/><br/>Crystal Growth and Wafer Preparation (Page-9), Epitaxy (Page-55), Oxidation (Page-98), Lithography (Page-141), Reactive Plasma Etching (Page-184), Dielectric and Polysilicon Film Deposition (Page-233) Diffusion (Page-272), Ion Implantation (Page-327), Metallization (Page-375), Process Simulation (Page-422), VLSI Process Integration (Page-466), Analytical Techniques (Page-516), Assembly Techniques and Packaging of VLSI Devices (Page-566), Yield and Reliability (Page-612). 
<br/><br/><label>ISBN: </label>0070627355 : 
<br/><br/><label>LCCN: </label>87022803 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits--Very large scale integration.
<br/><br/><label>Dewey Class. No.: </label>621.395.VLS