TY  - GEN
AU  - Sze,S.M.
TI  - VLSI technology
SN  - 0070627355 :
U1  - 621.395.VLS 
PY  - 1988///
CY  - New York
PB  - McGraw-Hill
KW  - Integrated circuits
KW  - Very large scale integration
N1  - Crystal Growth and Wafer Preparation (Page-9), Epitaxy (Page-55), Oxidation (Page-98), Lithography (Page-141), Reactive Plasma Etching (Page-184), Dielectric and Polysilicon Film Deposition (Page-233) Diffusion (Page-272), Ion Implantation (Page-327), Metallization (Page-375), Process Simulation (Page-422), VLSI Process Integration (Page-466), Analytical Techniques (Page-516), Assembly Techniques and Packaging of VLSI Devices (Page-566), Yield and Reliability (Page-612)
UR  - http://www.loc.gov/catdir/description/mh022/87022803.html
UR  - http://www.loc.gov/catdir/toc/mh021/87022803.html
ER  -