Emerging technologies for in situ processing / 
edited by Daniel J. Ehrlich and Van Tran Nguyen. 
 - Dordrecht ;  Boston :  Norwell, MA, USA :  M. Nijhoff ;  Distributors for the U.S. and Canada, Kluwer Academic Publishers,  1988. 
 - x, 290 p. :  ill. ;  25 cm. 
 - NATO ASI series.  Series E,  no. 139 .
<br/><br/>In-Situ processing combining MBE (Page-1), Motivations and early demonstration for In-Situ processing (Page-13), Laser eching and microelectronic applications (Page-23), Laser induced chemical processing of materials (Page-33), High technology manufacturing (Page-45), Ultra high vaccum processing (Page-55), Expitaxial growth of III-V materials (Page-61), Ion lithgraphy  projection (Page-113), Direct writing of silicon conductors (Page-265), Subject index (Page-289). 
<br/><br/><label>ISBN: </label>9024737338 
<br/><br/><label>LCCN: </label>88015503 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits--Very large scale integration--Design and construction--Congresses.
<br/><br/><label>Dewey Class. No.: </label>621.395,EME