Lieberman, M. A. <br/><br/>
Principles of plasma discharges and materials processing / 
Michael A. Lieberman, Allan J. Lichtenberg. 
 - 2nd ed. 
 - Hoboken, N.J. :  Wiley-Interscience,  c2005. 
 - xxxv, 757 p. :  ill. ;  25 cm. 
<br/><br/>
<br/><br/>Includes bibliographical references (p. 735-748) and index. 
<br/><br/><label>ISBN: </label>0471720011  
<br/><br/><label>LCCN: </label>2004058503 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Plasma dynamics.<br/>Thin films--Surfaces.<br/>Plasma etching.<br/>Plasma chemistry--Industrial applications.
<br/><br/><label>LC Class. No.: </label>QC718.5.D9  / L54 2005 
<br/><br/><label>Dewey Class. No.: </label>530.44  / LIE-P 2005