TY  - BOOK
AU  - Lieberman,M.A.
AU  - Lichtenberg,Allan J.
TI  - Principles of plasma discharges and materials processing
SN  - 0471720011 
AV  - QC718.5.D9 L54 2005
U1  - 530.44 22
PY  - 2005///
CY  - Hoboken, N.J.
PB  - Wiley-Interscience
KW  - Plasma dynamics
KW  - Thin films
KW  - Surfaces
KW  - Plasma etching
KW  - Plasma chemistry
KW  - Industrial applications
N1  - Includes bibliographical references (p. 735-748) and index
UR  - http://www.loc.gov/catdir/enhancements/fy0618/2004058503-b.html
UR  - http://www.loc.gov/catdir/enhancements/fy0618/2004058503-d.html
UR  - http://www.loc.gov/catdir/enhancements/fy0618/2004058503-t.html
ER  -