| 000 | 00822 a2200193 4500 | ||
|---|---|---|---|
| 003 | Nust | ||
| 005 | 20221202100322.0 | ||
| 010 | _a 88006279 | ||
| 020 | _a0126400458 (alk. paper) | ||
| 040 | _cNust | ||
| 082 | 0 | 0 | _a621.38152,SHI |
| 100 | 1 |
_aShimura, Fumio. _966725 |
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| 245 | 1 | 0 |
_aSemiconductor silicon crystal technology / _cFumio Shimura. |
| 260 |
_aSan Diego : _bAcademic Press, _cc1989. |
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| 300 |
_aviii, 426 p. : _bill. ; _c24 cm. |
||
| 505 | _aIntroduction (Page-1), Basic Crystallography (Page-22), Basic Semiconductor Physics (Page-82), Silicon Crystal Growth and Wafer Preparation (Page-114), Crystal Characterization (Page-215), Grown in and Process-Induced Defects (Page-279), Silicon Wafer Criteria for VLSI/ ULSI Technology (Page-378). | ||
| 650 | 0 | _aTelecommunication Engineering. | |
| 942 |
_cBK _2ddc |
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| 999 |
_c175752 _d175752 |
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