000			01483 a2200241 4500
003			Nust
005			20221130171837.0
010			_a 89002844
020			_a0023781408
040			_cNust
082	0	0	_a621.38152,MAY
100	1		_aMayer, James W., _9103554
245	1	0	_aElectronic materials science : _bfor integrated circuits in Si and GaAs / _cJames W. Mayer, S.S. Lau.
260			_aNew York : _bMacmillan ; _aLondon : _bCollier Macmillan, _cc1990.
300			_axx, 476 p. : _bill. ; _c25 cm.
505			_a Integrated Circuits (Page -1), Current Flow and Capacitance (Page -27), Bands Bonds and Semiconductors (Page -51), Barriers and Junctions (Page -82), Transistors: Bipolar and Field Effect (Page -111), Crystallography and Crystalline Defects (Page -142), Diffusion in Solids (Page -183) Ion Implantation (Page -222), Thermal Oxidation of Silicon and Chemical Vapor Deposition of Insulating Films (Page -251), Metallization and Phase Diagrams (Page -276), Reaction Kinetics Sillcides Aluminides and Diffusion Barriers (Page -306), Energy Band and wave Behavior (Page -340), Heterostructures Transistors and Lasers (Page -375), Heteroepitaxy (Page -403), Assembly and Packaging (Page -440).
650		0	_aIntegrated circuits _xDesign and construction. _935781
650		0	_aIntegrated circuits _xMaterials. _9103555
650		0	_aTelecommunication Engineering
650		0	_aTransistor circuits _xMaterials. _9103557
700	1		_aLau, S. S. _9103558
942			_2ddc _cBK
999			_c182259 _d182259