000 01368 a2200229 4500
003 Nust
005 20230317113523.0
010 _a 88015503
020 _a9024737338
040 _cNust
082 0 0 _a621.395,EME
245 1 0 _aEmerging technologies for in situ processing /
_cedited by Daniel J. Ehrlich and Van Tran Nguyen.
260 _aDordrecht ;
_aBoston :
_bM. Nijhoff ;
_aNorwell, MA, USA :
_bDistributors for the U.S. and Canada, Kluwer Academic Publishers,
_c1988.
300 _ax, 290 p. :
_bill. ;
_c25 cm.
440 0 _aNATO ASI series.
_nSeries E,
_vno. 139
_9104591
505 _aIn-Situ processing combining MBE (Page-1), Motivations and early demonstration for In-Situ processing (Page-13), Laser eching and microelectronic applications (Page-23), Laser induced chemical processing of materials (Page-33), High technology manufacturing (Page-45), Ultra high vaccum processing (Page-55), Expitaxial growth of III-V materials (Page-61), Ion lithgraphy projection (Page-113), Direct writing of silicon conductors (Page-265), Subject index (Page-289).
650 0 _aIntegrated circuits
_xVery large scale integration
_xDesign and construction
_xCongresses.
_9110510
700 1 _aEhrlich, Daniel J.
_9110511
700 1 _aNguyen, Van Tran.
_9110512
710 2 _aNorth Atlantic Treaty Organization.
_bScientific Affairs Division.
_995775
942 _cBK
_2ddc
999 _c193616
_d193616