000 01276cam a2200373 a 4500
001 8569414
003 USPCAS-E
005 20180118181420.0
006 m d
007 cr n
008 091216s2010 ne a sbf 001 0 eng d
020 _z9780815520375
020 _a9780080946580
035 _a(WaSeSS)ssj0000419251
040 _aCaPaEBR
_cCaPaEBR
_dWaSeSS
050 4 _aTS695
_b.M38 2010eb
050 4 _aTS695
082 _222
_a671.735
_bMAT-H 2010
100 1 _aMattox, D. M.
210 1 0 _aHandbook of physical vapor deposition (PVD) processing
245 1 0 _aHandbook of physical vapor deposition (PVD) processing
_cDonald M. Mattox.
250 _a2nd ed.
260 _aAmsterdam :
_bElsevier,
_c2010.
502 _a.
504 _aIncludes bibliographical references and index.
506 _aLicense restrictions may limit access.
650 0 _aPhysical vapor deposition
_vHandbooks, manuals, etc.
655 7 _aElectronic books.
_2local
710 2 _aebrary, Inc.
773 0 _teBook - Materials Science 2010 [EBCMS10]
856 4 0 _uhttp://www.columbia.edu/cgi-bin/cul/resolve?clio8569414
_zFull text available from eBook - Materials Science 2010 [EBCMS10]
910 _aVendor-generated brief record
942 _2ddc
_cBK
999 _c355988
_d355988